Horizontal diffusion furnace, furnaces for the semiconductor industry
	Koyo Thermo Systems Co., Ltd. is represented in Europe by Crystec Technology Trading GmbH
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Koyo Thermo Systems Horizontal Furnaces

Koyo Thermo Systems manufactures numerous versions of horizontal furnaces with full automation or manual loading. Smaller versions for pilot and laboratory applications are available.

These furnaces are known under various different names: Horizontal, diffusion, tube, doping, semiconductor, oxidation furnace, furnaces. They are available for almost all thermal processes used in the semiconductor production technology like diffusion, oxidation, LPCVD ( nitride, poly-silicon, TEOS ) as well as solar cell doping by phosphorus oxychloride POCl₃.
Special versions for low temperature applications, e.g. for polyimide baking, copper anneal, low-k anneal, SOG or hydrogen anneal are specialities of Koyo Thermo Systems.

Furnace:

• wafer 3" - 8"
• flat zone length from 250mm - 1000mm
• 3 or 4 tubes
  
• DDC / host connection

Construction:

• Process isolation with independent tube levels.
• Optional lift mechanism for ease of process chamber removal
• Positive floor seal with integral leveling frame.
  
• Vertical profile gas plumbing providing for rear process tube removal.

Loading station:

• Horizontal laminar flow
• Overhead lights
  
• Cantilever or soft lander loading

Scavenger exhaust / Cooling:

• Integral element scavenger assembly
• (2) Air to water heat exchangers per tube level
• Positive seal with exhaust monitor
• Load and scavenger exhaust collar diffuses air flow around wafer load during loading and unloading.
  
• Superseal energy kit.

Maintenance / Access:

• Independent tube levels with pull out process chambers.
• Pressure regulators/gauges located in base of source cabinet for ease access.
• All thermocouples entered from source end and are supported the full length of the heat zone.
• Front access.
  
• Built in heating element alignment system.

Heating element options:

• LGO heater for superior performance up to 1100°C
  
• HGC heater for high temperature applications until 1250°C

Quarzware:

• Reaction chamber, consisting of quartz tube and boat, sometimes, liner, injector, T/C-tube, etc.
  
• For high temperature versions, SiC tube and boat are available.

Automation:

• Elevator.
  
• Fully automatic loading by robot.

New alternative furnace for R&D facilities and pilot lines:

Are you looking for a horizontal furnace, just because it is much cheaper than a vertical one? Do you have a small throughput and would you like to run small batches? Are you interested in a super performance? Koyo Thermo Systems developed a vertical furnace just for you! Please have a look at Koyo Thermo Systems's new VF1000 furnace!

This new furnace is a small vertical furnace with full performance, especially designed for pilot lines and laboratories. It is a mini-batch version for 25 production wafer load. It is available for all wafer diameters 3" - 12". Manual loading of wafers keeps the costs down and guarantees a high degree of flexibility. Small dimensions also help reducing costs for the user. Automatic elevator and programmable controller are used to achieve high process performance. VF1000 furnaces are available for all processes and show the same performance as the big versions VF5100 and VF5300. Like the big versions, VF1000 furnaces are equipped with patented Koyo Thermo Systems LGO heating elements. The available temperature range is 140°C to 1250°C.

Please follow this link in order to find a comparison of advantages and disadvantages of vertical and horizontal furnaces!

Koyo Thermo Systems and Crystec will be pleased to engineer a cost effective system to satisfy your most demanding and exacting requirements.

Crystec Technology Trading GmbH will be pleased to further discuss details with you.
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