Koyo Thermo Systems Fours Horizontaux
Koyo Thermo Systems manufactures numerous
versions of horizontal furnaces with full automation or manual loading. Smaller versions
for pilot and laboratory applications are available. These furnaces are known under various
different names: Horizontal, diffusion, tube, doping, semiconductor,
oxidation furnace, furnaces. They are available for almost all thermal
processes used in the semiconductor production technology like
diffusion,
oxidation, LPCVD (
nitride,
poly-silicon,
TEOS) as well as
solar cell doping by phosphorus
oxychloride POCl3.
Special versions for low temperature applications, e.g. for
polyimide baking,
copper anneal,
low-k anneal,
SOG or
hydrogen anneal are specialities
of Koyo Thermo Systems.
Furnace:
- wafer 3" - 8"
- flat zone length from 250mm - 1000mm
- 3 or 4 tubes
- DDC / host connection
Construction:
- Process isolation with independent tube levels.
- Optional lift mechanism for ease of process chamber removal
- Positive floor seal with integral leveling frame.
- Vertical profile gas plumbing providing for rear process
tube removal.
Loading station:
- Horizontal laminar flow
- Overhead lights
- Cantilever or soft lander loading
Scavenger exhaust / Cooling:
- Integral element scavenger assembly
- (2) Air to water heat exchangers per tube level
- Positive seal with exhaust monitor
- Load and scavenger exhaust collar diffuses air flow around
wafer load during loading and unloading.
- Superseal energy kit.
Maintenance / Access:
- Independent tube levels with pull out process chambers.
- Pressure regulators/gauges located in base of source
cabinet for ease access.
- All thermocouples entered from source end and are
supported the full length of the heat zone.
- Front access.
- Built in heating element alignment system.
Heating element options:
Quarzware:
- Reaction chamber, consisting of quartz tube and boat, sometimes, liner, injector,
T/C-tube, etc.
- For high temperature versions, SiC tube and boat are available.
Quartz and SiC parts need regular
cleaning.
Automation:
- Elevator.
- Fully automatic loading by robot.
New alternative furnace for R&D
facilities and pilot lines:
Are you
looking
for a horizontal furnace, just because it is much cheaper than a
vertical
one? Do you have a small throughput and would you like to run small
batches?
Are you interested in a super performance? Koyo Thermo Systems
developed
a vertical furnace just for you! Please have a look at Koyo Thermo
Systems's
new VF1000 furnace!
This new furnace is a small vertical furnace
with full performance,
especially designed for pilot lines and laboratories. It is a
mini-batch
version for 25 production wafer load. It is available for all wafer
diameters
3" - 12". Manual loading of wafers keeps the costs down and guarantees
a
high degree of flexibility. Small dimensions also help reducing costs
for
the user. Automatic elevator and programmable controller are used to
achieve
high process performance. VF1000 furnaces are available for all
processes
and show the same performance as the big versions VF5100 and VF5300.
Like
the big versions, VF1000 furnaces are equipped with patented Koyo
Thermo
Systems LGO heating elements. The available temperature range is
140°C
to 1250°C.
You can see and evaluate these furnaces in
Uppsala at the
Ångström Laboratory of the University
which works together with Koyo as an application center for VF1000
vertical
furnaces. On special request we can arrange for you also a visit at
Southampton
University in order to show these furnaces.
Please follow this link in order to find a
comparison of advantages and disadvantages of vertical and horizontal furnaces!
Koyo Thermo Systems et
Crystec sont prêts à étudier pour vous, le
système qui répondra à vos exigences en
présentant le meilleur rapport qualité / prix.
| Crystec Technology Trading GmbH est à votre disposition pour vous aider dans la réalisation de vos projets. |
Table
des Matières
|
Pour obtenir des informations supplémentaires
n'hésitez pas à nous contacter. |
Début de page |