Fours verticaux pour 150mm et 200mm wafer.
Koyo Thermo Systems

Koyo Thermo Systems Co., Ltd. est représentée en Europe par
Crystec Technology Trading GmbH

Crystec
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Fours Verticaux   VF-1000/VF-3000   VF-5100/VF-5300   VF-5700/VF-5900

VF-5100

From small-run multiple component production to full production capability

The successful VF-5100 vertical furnace series employs a robot arm to convey wafers ranging in diameter from 4 to 8 inches.


Summary

The VF-5100 was developed in 1990 as Koyo's first vertical furnace featuring robot-based conveyance. This popular model is presently being used production facilities throughout the world. The wafer conveying system is very reliable and maintenance is simple. The cassette stocker is arranged on a turntable, and a single-armed this word is same as VF-5100 robot is used to convey the wafers. VF-5100's heating element enjoys a high degree of customer satisfaction.


Features

1. Stocker
The turntable-type cassette stocker has a simplified structure for ease of maintenance.

2. Transfer system
The simplified design enhances the reliability of the wafer conveyance functions.

3. N2 load lock
The VF-5100 was the first furnace to have a N2 load lock to reduce the effects of natural oxide films.

4. Installation
The VF-5100 can be installed in a side-to-side arrangement.

VF-5100

Specification


Model VF-5100
Wafer size 4" - "8
Outside dimension(mm) W1000 x D1950 x H3250
Batch size 150
Continual treatment -
Heater LGO heater
Service temperature 300 - 1050°C
Flat zone(mm) 960
Temperature control 4zone
Cassette stock 8
Process cassette 6
Dummy cassette 1
Monitor cassette 1
Wafer transfer vacuum/vacuumless
Finger 5
Controller Model 1000
Applicable to SECS possible
Applicable to AGV possible
Applicable to SMIF/FOUP possible


A Summary of Process Performance


Pyro.Ox Thick
film
Pyro.Ox Thin
film
P-D-Poly Poly-Si HTO Si3N4 TEOS
Reaction gas O2.H2 O2.H2 SiH4.PH3.H2 SiH4 SiH2Cl2.N2O SiH2Cl2.NH3 Si(C2H5O)4.O2
Growth temp.(deg.-c) 1000 - 1250 800 - 1000 550 - 600 600 - 620 870 - 890 770 - 800 - 750
Growth rate(A/min) - - 12 - 20 60 - 100 40 - 50 20 - 50 - 100
Number of wafer(sheet) 150 150 25 100 100 100 100/50
Thickness
variation(%)
Inside wafer 2 2 3 2 3 3 4 3
Between wafers 2 2 2 2 3 2 3 2
Between batches 2 2 2 1 2 2 2 2


Crystec Technology Trading GmbH, Germany, www.crystec.com, +49 8671 882173, FAX 882177
Linie

VF-5300



The VF-5900 furnace is a continuation of the VF-530The VF-5300 vertical furnace can process 8-inch wafers in batches of up to 150 wafers per run. This furnace has been designed with factory automation in mind and is compatible with AGV and SMIF systems.




Summary

The VF-5300 represents the evolution of the VF-5100 model and can stock 20 cassettes at a time. An optional feature allows the VF-5300 to process up to 3 batches in succession. This high-performance furnace has all the features required in an 8-inch wafer furnace and is widely used both in Japan and overseas. The multi-level turntable stocker makes operator training extremely simple. The functions that transfer the cassettes and wafers are very reliable and adaptable. The LGO heating element creates a long, stable uniform heating length, and has excellent stability and heat-up/cool-down characteristics at low temperatures.



Features

1. Stocker
The stocker can hold up to 20 cassettes and is capable of 2- batches continuous processing. (An option allows 3 batches to be processed in succession.)

2. Temperature characteristics
The VF-5300 uses an LGO heating element that is surpassed at low temperatures. Temperature characteristics are excellent.

3. A full range of functions
The VF-5300 has all the functions required for the thermal processing of 8-inch wafers.

4. Wafer conveyance
The VF-5300 can be set up for a wide range of wafer conveyance modes.

VF-3000

Specification


Model VF-5300
Wafer size 4" - "8
Outside dimension(mm) W900 x D2300 x H3250
Batch size 150
Continuous treatment 2/3 batch
Heater LGO heater
Service temperature 300 - 1050deg.-c
Flat zone(mm) 960
Temperature control 4zone
Cassette stock 20
Process cassette 12
Dummy cassette 5
Monitor cassette 3
Wafer transfer vacuumless
Finger 5+1
Controller Model 1100
Applicable to SECS possible
Applicable to AGV possible
Applicable to SMIF/FOUP possible


A Summary of Process Performance


Pyro.Ox Thick
film
Pyro.Ox Thin
film
P-D-Poly Poly-Si HTO Si3N4 TEOS
Reaction gas O2.H2 O2.H2 SiH4.PH3.H2 SiH4 SiH2Cl2.N2O SiH2Cl2.NH3 Si(C2H5O)4.O2
Growth temp.(deg.-c) 1000 - 1250 800 - 1000 550 - 600 600 - 620 870 - 890 770 - 800 - 750
Growth rate(A/min) - - 12 - 20 60 - 100 40 - 50 20 - 50 - 100
Number of wafer(sheet) 150 150 25 100 100 100 100/50
Thickness
variation(%)
Inside wafer 2 2 3 2 3 3 4 3
Between wafers 2 2 2 2 3 2 3 2
Between batches 2 2 2 1 2 2 2 2

Crystec Technology Trading GmbH, Germany, www.crystec.com, +33/476/911002, FAX 911168
line

Tous les modèles de fours listés ci-dessus répondent aux normes CE et sont certifiés chez le constructeur par un organisme agréé.

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