Dry Exhaust Gas Cleaner
SemiAn Technology is represented in Europe by
Dry scrubber use a catalyst to remove toxic
components by chemisorption or adsorption to their surface. The
required contact time is very short and does not depend on the
inlet concentration. When most of the material has reacted, the
cartridge with the catalyst has to be exchanged. This abatement method can be used for
almost all processes used in the microelectronic industry. It does not
require power, gases, or water for the gas cleaning. However, it requires
maintenance. The catalyst has to exchanged regularly and the waste material has to
be disposed. Adsorber material mixed with some color agent or indicator is
used to indicate in a special window, when 90% of the catalyst has been
used and the material needs to be exchanged. It is possible to install
an automatic alarm based on an electronic color sensor.
This scrubbing technology is therefore
recommended for smaller concentrations of toxic components, because the life time of one
cartridge filling is long in this case. It is also a good choice for emergency applications,
where a high contamination risk for the surrounding has to be
prevented. In this case, the scrubber is not used continuously, but only at special
occasions and wet scrubber or burn and wet scrubber would not be suitable.
SemiAn offers dry scrubber which have been developed for cleaning exhaust gas from single process tools, as they are used in the semiconductor and LCD industry. Therefore our gas cleaner are sized for a gas flow in the range of 100 - 1.200 slm or 6 - 72 m3/h. Of course, we can also offer gas scrubber of that size for other applications also. Our equipment is reliable and cost effective.
|SSD 50, SSD 100, SSD 200|
The following chemicals can be adsorbed, using 6 different catalysts.
|Adsorption Agent||Removal Gases|
|Zebent 1||BCl3, Cl2, etc.|
|Zebent 2||BCl3, BF3, Cl2, HBr, HCl, HF, F2, WF6, etc.|
|Zebent 3||B2H6, SiH2Cl2, SiH4, Si2H6, TEOS, TMB, TMP, etc.|
|Zebent 4||BCl3, Cl2, NH3, SiH2Cl2, etc.|
|Zebent 5||AsH3, B2H6, H2S, H2Se, PH3, etc.|
|Zebent 6||BCl3, BF3, Cl2, GeF4, HBr, HCl, HF, F2, etc.|