|Dry Exhaust Gas Cleaner.|
SemiAn Technology is represented in Europe by
SemiAn Korea Company Wet Cleaning Wet+Burn Plasma Catalyst
Dry scrubber use a catalyst to remove toxic
components by chemisorption or adsorption to their surface. The
required contact time is very short and does not depend on the
inlet concentration. When most of the material has reacted, the
cartridge with the catalyst has to be exchanged. This abatement method can be used for
almost all processes used in the microelectronic industry. It does not
require power, gases, or water for the gas cleaning. However, it requires
maintenance. The catalyst has to exchanged regularly and the waste material has to
be disposed. Adsorber material mixed with some color agent or indicator is
used to indicate in a special window, when 90% of the catalyst has been
used and the material needs to be exchanged. It is possible to install
an automatic alarm based on an electronic color sensor.
This scrubbing technology is therefore
recommended for smaller concentrations of toxic components, because the life time of one
cartridge filling is long in this case. It is also a good choice for emergency applications,
where a high contamination risk for the surrounding has to be
prevented. In this case, the scrubber is not used continuously, but only at special
occasions and wet scrubber or burn and wet scrubber would not be suitable.
SemiAn offers dry scrubber which have been developed for cleaning exhaust gas from single process tools, as they are used in the semiconductor and LCD industry. Therefore our gas cleaner are sized for a gas flow in the range of 100 - 1.200 slm or 6 - 72 m3/h. Of course, we can also offer gas scrubber of that size for other applications also. Our equipment is reliable and cost effective.
SSD 50, SSD 100, SSD 200
Gas treatment and abatement type room temperature chemisorption reactor for the combination with semiconductor CVD, ion implant, and dry etcher. A by-pass cartridge is installed for emergency treatment of the exhaust gas. The temperature is detected in order to protect the scrubber against overheating by adsorption heat and the inlet pressure is measured to ensure a continuous gas flow trough the cleaner. Operation of the system is done via a touch screen TFT monitor.
As an option inlet gas detection system,gas leakage detection system, central monitoring system, and process tool interface system are available.
The following chemicals can be adsorbed, using 6 different catalysts.
|Adsorption Agent||Removal Gases|
|Zebent 1||BCl3, Cl2, etc.|
|Zebent 2||BCl3, BF3, Cl2, HBr, HCl, HF, F2, WF6, etc.|
|Zebent 3||B2H6, SiH2Cl2, SiH4, Si2H6, TEOS, TMB, TMP, etc.|
|Zebent 4||BCl3, Cl2, NH3, SiH2Cl2, etc.|
|Zebent 5||AsH3, B2H6, H2S, H2Se, PH3, etc.|
|Zebent 6||BCl3, BF3, Cl2, GeF4, HBr, HCl, HF, F2, etc.|
|Crystec Technology Trading GmbH will be pleased to further discuss details with you.|
| Are you interested in further
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