Pulvérisation cathodique
Crystec

Crystec Technology Trading GmbH
Équipement pour l'Industrie des Sémiconducteurs et LCD

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Plasma   gravure de plasma   nettoyage   décapsulation   PECVD   Si3N4   Si02   Extrémité   Graphen   E-Beam   Sputter

Pulvérisation cathodique

For the deposition of metallic layers or also oxides on a substrate, sputter technology can be used. One or several targets are installed in a vacuum chamber. The bombardment of the target by energetic ions ejects atoms from the target and brings them to the gas phase, from where they are deposited on the substrate.
This technology has many applications in the semiconductor industry, MEMS production, manufacturing of thin film solar cells, for metallization and contact formation of LEDs and OLED parts, for flat panel display and touch screen manufacturing, for hard coating of optics and preparation of energy saving windows. Sputtering can be even used for the preparation of diamond like coatings.

SNTEK Sputter equipment for mass production of thin film solar cells and flat panel displays

For the production of thin film solar cells and liquid crystal displays, it is necessary to prepare large area electrical contacts. The deposition with transparent conductive oxides on the front side or metallic contacts on the backside is done by large inline sputter systems. The glass plate move either horizontally or space saving, vertically through these sputter systems.

Horizontal inline sputter system Vertical inline sputter system
Large Scale horizontal inline Sputtering Equipment for thin film solar cell production. Suitable for deposition of transparent conductive oxides TCO and metal contacts.

Substrate Type : Glass
Substrate Size : 2 Gen ~ 6 Gen
Metal Coating : Mo, Al, CIGS, Ag, Cr, etc
Oxide Coating : AZO, GZO, ITO, ZnO, etc
Glass Heating : Max 300°C
Large Scale vertical inline TCO Sputtering Equipment for thin film solar cell production. Suitable for deposition of transparent conductive oxides TCO and metal contacts.

Substrate Type : Glass
Substrate Size : 2 Gen ~ 6 Gen
Metal Coating : Mo, Al, CIGS, Ag, Cr, etc
Oxide Coating : AZO, GZO, ITO, ZnO, etc
Glass Heating : Max 300°C

SNTEK Sputter machine for single substrate deposition and for R&D

For small samples as they are used in the semiconductor industry, MEMS manufacturing, for silicon solar cells or LED production, sputter machines with manual loading or automatic loading from cassettes are available.

Sputter Sputter Sputter Sputter
Magnetron Sputter Gun : 2~16 inch
Substate Size : ~ 200mm x 200mm
Application : Semi & Solar
Cathode : ~ 4 ea
Application : TFT
Substrate : ~ 200 sqmm
Cathode : ~ 3 ea
Substrate Size : 156mm x 156mm Solar Wafer 12pcs
Application : Solar
Cathode : ~ 4 ea
Application : Semi & Solar
Substrate : ~ 16"
Cathode : ~ 4 ea

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